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TU-Tungt utstyr

Field emission scanning electron microscope for nanostructuring and surface modification by electron beam lithography

Tildelt: kr 5,0 mill.

Electron beam lithography is a state-of-the-art technique for nanotechnological research, enabling nano-structuring of a variety of materials for both applied research as well as for fundamental studies of properties of nanoscale materials. For the dev elopment of the nanostructuring capabilities at NTNU it is necessary to have easy access to state-of-the-art equipment. Electron beam lithography has manifests itself as the major technique for nanolithography. The system should be equipped with a laser s tage enabling stitching and ready to accommodate external EBL electronics (Raith Elphy Plus) already acquisitioned. The instrument is to be located in the cleanroom of NTNU NanoLab, and will be available for all users of NTNU NanoLab. The main advantages of such an investmetn are: a) The possibility to structure scientifically and technologically important materials systems with nanometer resolution. b) The instrument opens for developing nanostructured devices, both for applied research such as senso r technology and fundamental studies of properties of nanoscale systems. c) Provide a common technology platform where research from different departments can meet, enabling true innovative interdisciplinary research. d) Access to the above-mentioned me asurements on a regular basis. e) Provide state-of-the-art equipment for MSc and PhD candidates in their training. The investment of modern equipment with a good user interface will also lower the threshold for new users of the equipment in line with th e cross-disciplinary nature of NanoLab. NTNU NanoLab plans to have 5 engineers in order to service and maintain the equipment in the laboratory.

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TU-Tungt utstyr

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