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KVAL: SSELA CVD - Scaling diamond CVD for market applications

Alternative title: SSELA CVD: oppskalering av diamant CVD for ulike markedsapplikasjoner

Awarded: NOK 0.50 mill.

Project Number:


Project Period:

2020 - 2021

Funding received from:


Since the 1950s scientific progress have made it possible for mankind to reproduce diamonds with equal characteristics as natural diamonds. Its unique properties have put it to use for many applications from drilling to jewellery. Most widely used methods for diamond growth are Microwave Plasma Enhanced Chemical Vapour Deposition (MWPECVD) and hot filament Chemical Vapour Deposition (HFCVD). The HFCVD is a preferred method for a large area CVD due to relatively low cost and scalability. The major drawback of HFCVD is contamination of the films by impurities from the filaments, which narrows down the scope of applications to simpler coatings of tools, components and other wear and tear purposes. Therefore, for the growth of high purity diamonds and diamond films MWPECVD is used. However, the deposition area of current MWPECVD reactors is limited by the discharge shape and size of the resonant cavity. In this project we have worked on developing a novel MWPECVD method which can mitigate this problem. The technology has commercial with uses in electronics, biosensors and other application areas. If we succeed with the commercialization it will have clear benefits for society. One can potentially reduce energy waste in electronics applications, create faster and reliable diagnostic tools, reduce CO2-impact on products where diamond is a key component, amongst other things. Behind the invention is a strong academic and commercial team who has worked within this field consistently over the years. They have accumulated knowledge and expertise of vital importance. In the project we have developed the technology and achieved milestones. Based on this work we further progressed our commercialization process and reduced our risk.